Challenges in Simultaneous Microstructuring and Hyperdoping of Germanium with Ultrafast Laser Dmytro Gnatyuk, Sara Hamed, Masoud Ebrahimzadeh, Hanchen Liu, Ville Vähänissi, Pekka Laukkanen, Hele Savin, Xiaolong Liu Physica Status Solidi A Applications and Materials Science, 2026 Germanium's compatibility with Complementary Metal‐Oxide‐Semiconductor (CMOS) and strong near‐infrared response make it an attractive platform for infrared photonics, but its intrinsic material properties hinder straightforward extension of absorption beyond the band edge. In this perspective, we synthesize recent and new experiments and analyses on femtosecond‐laser approaches that attempt to combine surface microstructuring and hyperdoping of Ge in a single step. We argue that, unlike silicon, Ge's high optical absorption at visible/green wavelengths, shallow energy deposition, lower melting point, and reduced thermal conductivity favor intense localized heating, evaporation, and redeposition—conditions that both produce high baseline sub‐bandgap absorption from damage and prevent effective incorporation of thin‐film dopant precursors. In a case example, Ti shows only trace incorporation from qualitative measurements. We discuss why laser‐induced structural disorder, rather than stable deep dopant incorporation, dominates the optical response, and we outline practical pathways forward: exploring longer wavelengths or gas‐phase chemistries, applying separate in situ heating, or decoupling texturing from heavy doping.
Carrier mobility in crystalline germanium at high injection: experimental characterization of carrier-carrier scattering Moisés Garín, Mansur Gamel, Marko Yli-Koski, Ville Vähänissi, Gerard Rivera, Hele Savin, Isidro Martín Solar Energy Materials and Solar Cells, 2026 The decay of the sum of electron and hole mobilities, μ s = μ n + μ p , due to carrier-carrier scattering was experimentally investigated in crystalline germanium (Ge) at high-injection conditions. Contactless measurements of the mobility sum as a function of the excess carrier density (Δ n ) in Ge were obtained using photoconductance decay methods. First, the measurement method was revised and improvements were introduced to ensure that μ s (Δ n ) could be obtained for independent samples with improved accuracy. This method is successfully validated with crystalline silicon and, then, applied to Ge samples of different doping types and resistivity. The analysis of the data suggests that the mobility decay at high injection levels cannot be properly explained with the usual assumption of equal cross section for carrier-carrier and carrier-ion scattering events. Instead, we find the mobility sum due to carrier-carrier scattering to be inversely proportional to Δ n according to the expression 8 × 10 20 ·Δ n −1 cm 2 V −1 s −1 . The limitations and potential error sources of the measurement method are discussed and, finally, the mobility model is used to improve lifetime analysis at high injection, allowing to estimate the ambipolar Auger recombination coefficient at C amb = 7 × 10 −31 cm 6 s −1 .
Transforming Schottky to Ohmic Contacts via Ultrahigh-Vacuum Engineered Interfacial Alloying Masoud Ebrahimzadeh, Perttu Piispanen, Sari Granroth, Mikko Miettinen, Ilari Angervo, Hanchen Liu, Markus Otsus, Risto Punkkinen, Marko Punkkinen, Ville Vähänissi, Kalevi Kokko, Petriina Paturi, Kaupo Kukli, Hele Savin, Pekka Laukkanen ACS Applied Materials and Interfaces, 2025 Low-resistive Ohmic contacts are needed in most microelectronics and photonics devices to connect a device to the electric circuit. Manufacturing of Ohmic contacts typically requires the doping of a semiconductor surface region as n-type or p-type (i.e., electron- or hole-doped, respectively). This task has, however, become challenging when the doping needs to be controlled with nanometer or even atomic level precision at lowered processing temperatures. In this work, we demonstrate a low-temperature method to tackle this contact manufacturing challenge using ultrathin antimony (Sb) doped germanium (Ge) nanolayers. We have integrated the method with the common lift-off processing to make Ohmic nickel (Ni) contacts on low-doped n-type Ge and Si substrates and on semi-insulating GaAs, which initially show the Schottky contacts. A proper combination of wet chemical cleaning plus depositing Sb and Ge atomic layers on the substrates, kept at room temperature, in a very clean environment of ultrahigh vacuum before the Ni-film deposition and postmetallization heating changes the Schottky contacts to Ohmic ones. Complementary methods are used to probe the physicochemical properties of interfaces during the manufacturing process to clarify the mechanisms behind the Ohmic-contact formation.
Impact of Er-Based Atomic Layer Deposited Upconverting Oxides on Si Solar Cell Surface Passivation Behrad Radfar, Amr Ghazy, Joona Pekkanen, Xiaolong Liu, Ville Vähänissi, Maarit Karppinen, Hele Savin Physica Status Solidi A Applications and Materials Science, 2025 Crystalline silicon solar cells face fundamental limitations in infrared (IR) absorption leading to significant solar energy losses. Using upconverting (UC) rare‐earth oxide layers is a potential solution to convert sub‐bandgap photons into higher‐energy photons that Si can absorb. However, integrating UC layers into solar cells can potentially affect surface passivation properties, which may result in recombination of photogenerated charge carriers at Si/UC interface. This study investigates the impact of atomic‐layer‐deposited mixed rare‐earth oxide (Y,Er,Ho)2O3 and Er2O3 UC layers on the passivation quality of Si interface, deposited directly on Si substrate or on the conventional passivation layers, i.e., SiO2 and Al2O3. Findings reveal that direct deposition provides very weak passivation (τeff ≈ 4.1 μs) which does not improve with post‐deposition annealing. Similarly, when deposited on top of SiO2 with optically relevant thickness, the resulting passivation is poor. However, UC layer on top of Al2O3 does not compromise the passivation performance, resulting in low surface recombination velocity of 1.5 cm s−1 for Er2O3 and 1.4 cm s−1 for (Y,Er,Ho)2O3. Consequently, the results indicate that it should be viable to integrate UC layer like Er2O3 into a state‐of‐the‐art solar cell to improve sub‐bandgap absorption without compromising the passivation properties.
Near-infrared germanium PIN-photodiodes with >1A/W responsivity Hanchen Liu, Toni P. Pasanen, Tsun Hang Fung, Joonas Isometsä, Antti Haarahiltunen, Steven Hesse, Lutz Werner, Ville Vähänissi, Hele Savin Light Science and Applications, 2025 Even though efficient near-infrared (NIR) detection is critical for numerous applications, state-of-the-art NIR detectors either suffer from limited capability of detecting incoming photons, i.e., have poor spectral responsivity, or are made of expensive group III-V non-CMOS compatible materials. Here we present a nanoengineered PIN-photodiode made of CMOS-compatible germanium (Ge) that achieves a verified external quantum efficiency (EQE) above 90% over a wide wavelength range (1.2–1.6 µm) at zero bias voltage at room temperature. For instance, at 1.55 µm, this corresponds to a responsivity of 1.15 A/W. In addition to the excellent spectral responsivity at NIR, the performance at visible and ultraviolet wavelengths remains high (EQE exceeds even 100% below 300 nm) resulting in an exceptionally wide spectral response range. The high performance is achieved by minimizing optical losses using surface nanostructures and electrical losses using both conformal atomic-layer-deposited aluminum oxide surface passivation and dielectric induced electric field -based carrier collection instead of conventional pn-junction. The dark current density of 76 µA/cm2 measured at a reverse bias of 5 V is lower than previously reported for Ge photodiodes. The presented results should have an immediate impact on the design and manufacturing of Ge photodiodes and NIR detection in general.
Charged thin film enables dopant free ohmic metal–semiconductor contact formation Lassi Lahtiluoma, Olli E. Setälä, Ville Vähänissi, Hele Savin Applied Surface Science, 2025 • Externally doping a semiconductor damages the lattice and increases recombination. • Surface carrier concentration can be increased by depositing a charged thin film. • Thin film induced carriers can be used to realize a dopant free ohmic contact. • Opening a charged thin film causes carriers to drift under the opening. • Contact resistivity of 0.24 mΩcm 2 was achieved with thin film induced contacts. Ohmic contacts are conventionally achieved by externally doping the surface of a semiconductor substrate underneath a metal contact. To avoid the inconveniences that come with heavy doping, we propose an alternative way of achieving an ohmic Al-Si contact utilizing a highly charged atomic layer deposited (ALD) Al 2 O 3 thin film. The idea is to utilize the negative charge of ALD Al 2 O 3 to attract holes towards the surface of the Si substrate and thereby induce a p+ region and consequently an Al/p+ Si contact. The results show that the Al 2 O 3 induced contacts are not only ohmic, but also have a low contact resistivity of 0.24 mΩ⋅cm 2 . This matches the requirements of various electron devices such as photodiodes indicating potential for the proposed contact formation method.
Effects of ultra-high vacuum treatments on n-type Si contact resistivity Mikko Miettinen, Esa Vuorinen, Juha-Pekka Lehtiö, Zahra Jahanshah Rad, Risto Punkkinen, Mikhail Kuzmin, Jarno Järvinen, Ville Vähänissi, Pekka Laukkanen, Hele Savin, Kalevi Kokko Applied Surface Science, 2025 Most electronic and photonic devices include ohmic metal–semiconductor junction(s), of which contact resistivity needs to be minimized for best efficiency of the devices. Interface defects in the junction usually degrade the junction’s performance, thus cleaning and passivation of semiconductor surface is crucial during contact fabrication. For silicon devices the RCA (Radio Corporation of America) cleaning has been the most known method. Here we have addressed the question whether it is still possible to develop Si surface treatments to decrease the contact resistivity. We have combined wet chemistry and ultra-high vacuum (UHV) heating for two cases: low and highly phosphorus-doped n-type Si. As compared to silicon surfaces treated only with wet chemistry, the contact resistivity is lowered when (i) lowly doped n-Si is rapidly heated at temperature around 1200 ° C in UHV followed by hydrofluoric (HF) acid dip before Ni sputtering; (ii) p-Si substrate with highly n-type surface is first immersed in HF, then UHV heated at 400 ° C followed by immersion to HF. Our results show that the final HF dip decreases surface oxide formation in air during sample transfer to the metal deposition, and that surface phosphorus concentration decreases at highly doped n-Si surfaces during elevated temperature UHV heating. • Effects of ultra-high vacuum (UHV) treatments on n-Si contact resistivity were studied. • Low-temperature UHV heating combined with HF-based wet chemistry decreases the Ni/n + -Si resistivity. • Significant silicide formation occurs at low temperatures, hindering standard lithography approach.
Femtosecond-laser-surface-nanostructured glass for building-integrated photovoltaics Lingju Meng, Mohammad Awashra, Sara Hamed, Dmytro Gnatyuk, Ville Vähänissi, Ville Jokinen, Hele Savin, Xiaolong Liu Materials and Design, 2025 Femtosecond-laser-surface-nanostructured glass for building-integrated photovoltaics. • Femtosecond-laser-nanostructured glass enhances solar concentrator efficiency. • Optimized nanostructures are achieved with optimized laser parameters. • A 55-fold increase in photocurrent compared to unprocessed glass is demonstrated. • Superhydrophobicity with 170° contact angles enables self-cleaning surfaces. • The scalable, one-step fabrication process is suitable for large-area applications. The emerging luminescent solar concentrators (LSC) for building-integrated photovoltaics (BIPV) face challenges such as narrow conversion spectrum, material degradation, high costs, and safety concerns, while their reliance on complex fabrication processes further hinders their practical application in large-area systems. In this paper, we present a novel application of femtosecond-laser-nanostructured borosilicate glass for BIPV, offering a promising alternative to traditional LSC windows. Utilizing a scalable, one-step femtosecond laser direct writing process, we fabricate nanostructured borosilicate glass specifically designed to effectively scatter incident light toward solar cells positioned at the edges of the glass. To optimize the laser processing, we perform comprehensive characterizations using scanning electron microscopy, X-ray diffraction, Raman spectroscopy, photoluminescence spectroscopy, and spectrophotometry. The proof-of-concept system demonstrates that the glass processed at an optimized scan speed exhibits a 55-fold increase in photocurrent generation compared to unprocessed glass, highlighting its enhanced optical efficiency. Additionally, a hydrophobic coating is applied on the nanostructured glass to confer self-cleaning properties, achieving superhydrophobicity with advancing and receding contact angles of approximately 170°. This novel approach to utilizing nanostructured glass for solar concentration shows considerable promise for improving both the efficiency and practicality of building-integrated photovoltaics.
Status report on emerging photovoltaics Annick Anctil, Meghan N. Beattie, Christopher Case, Aditya Chaudhary, Benjamin D. Chrysler, Michael G. Debije, Stephanie Essig, David K. Ferry, Vivian E. Ferry, Marina Freitag, Isaac Gould, Karin Hinzer, Harald Hoppe, Olle Inganäs, Lethy Krishnan Jagadamma, Min Hun Jee, Raymond K. Kostuk, Daniel Kirk, Stephan Kube, Minyoung Lim, Joseph M. Luther, Lorelle Mansfield, Michael D. McGehee, Duong Nguyen Minh, Preeti Nain, Matthew O. Reese, Angèle Reinders, Ifor D. W. Samuel, Wilfried van Sark, Hele Savin, Ian R. Sellers, Sean E. Shaheen, Zheng Tang, Fatima Toor, Ville Vähänissi, Ella Wassweiler, Emily L. Warren, Vincent R. Whiteside, Han Young Woo, Gang Xiong, Xitong Zhu SPIE Selections 50 Years of Solar Energy Research, 2024
Impact of post-ion implantation annealing on Se-hyperdoped Ge Xiaolong Liu, Patrick McKearney, Sören Schäfer, Behrad Radfar, Yonder Berencén, Ulrich Kentsch, Ville Vähänissi, Shengqiang Zhou, Stefan Kontermann, Hele Savin Applied Physics Letters, 2024
Bridging the gap between surface physics and photonics Pekka Laukkanen, Marko Punkkinen, Mikhail Kuzmin, Kalevi Kokko, Xiaolong Liu, Behrad Radfar, Ville Vähänissi, Hele Savin, Antti Tukiainen, Teemu Hakkarainen, Jukka Viheriälä, Mircea Guina Reports on Progress in Physics, 2024
Status report on emerging photovoltaics Annick Anctil, Meghan N. Beattie, Christopher Case, Aditya Chaudhary, Benjamin D. Chrysler, Michael G. Debije, Stephanie Essig, David K. Ferry, Vivian E. Ferry, Marina Freitag, Isaac Gould, Karin Hinzer, Harald Hoppe, Olle Inganäs, Lethy Krishnan Jagadamma, Min Hun Jee, Raymond K. Kostuk, Daniel Kirk, Stephan Kube, Minyoung Lim, Joseph M. Luther, Lorelle Mansfield, Michael D. McGehee, Duong Nguyen Minh, Preeti Nain, Matthew O. Reese, Angèle Reinders, Ifor D. W. Samuel, Wilfried van Sark, Hele Savin, Ian R. Sellers, Sean E. Shaheen, Zheng Tang, Fatima Toor, Ville Vähänissi, Ella Wassweiler, Emily L. Warren, Vincent R. Whiteside, Han Young Woo, Gang Xiong, Xitong Zhu Journal of Photonics for Energy, 2023
Role of CsMnCl3Nanocrystal Structure on Its Luminescence Properties Anastasia Matuhina, G. Krishnamurthy Grandhi, Fang Pan, Maning Liu, Harri Ali-Löytty, Hussein M. Ayedh, Antti Tukiainen, Jan-Henrik Smått, Ville Vähänissi, Hele Savin, Jingrui Li, Patrick Rinke, Paola Vivo ACS Applied Nano Materials, 2023
Effects of post oxidation of SiO2/Si interfaces in ultrahigh vacuum below 450 °C Zahra Jahanshah Rad, Juha-Pekka Lehtiö, Kexun Chen, Iris Mack, Ville Vähänissi, Mikko Miettinen, Marko Punkkinen, Risto Punkkinen, Petri Suomalainen, Hannu-Pekka Hedman, Mikhail Kuzmin, Jekaterina Kozlova, Mihkel Rähn, Aile Tamm, Hele Savin, Pekka Laukkanen, Kalevi Kokko Vacuum, 2022
Can hydrogenation mitigate Cu-induced bulk degradation in silicon? Ismo T. S. Heikkinen, Brendan Wright, Anastasia H. Soeriyadi, Marko Yli-Koski, Moonyong Kim, Ville Vahanissi, Brett J. Hallam, Hele Savin Conference Record of the IEEE Photovoltaic Specialists Conference, 2020
Black silicon back-contact module with wide light acceptance angle Pablo Ortega, Moises Garín, Guillaume Gastrow, Tuukka Savisalo, Antti Tolvanen, Henri Vahlman, Ville Vähänissi, Toni P. Pasanen, David Carrió, Hele Savin, Ramón Alcubilla Progress in Photovoltaics Research and Applications, 2020
High-sensitivity NIR photodiodes using black silicon Juha Heinonen, Antti Haarahiltunen, Michael Dov Serue, Ville Vähänissi, Toni P. Pasanen, Hele I. Savin, Lutz Werner, Mikko A. Juntunen Proceedings of SPIE the International Society for Optical Engineering, 2020
Semiconductor parameter extraction via current-voltage characterization and Bayesian inference methods Rachel C. Kurchin, Jeremy R. Poindexter, Daniil Kitchaev, Ville Vahanissi, Carlos del Canizo, Liu Zhe, Hannu S. Laine, Chris Roat, Sergiu Levcenco, Gerbrand Ceder, Tonio Buonassisi 2018 IEEE 7th World Conference on Photovoltaic Energy Conversion Wcpec 2018 A Joint Conference of 45th IEEE Pvsc 28th Pvsec and 34th Eu Pvsec, 2018
Finite- vs. infinite-source emitters in silicon photovoltaics: Effect on transition metal gettering Hannu S. Laine, Ville Vahanissi, Zhengjun Liu, Haibing Huang, Ernesto Magana, Ashley E. Morishige, Nabil Khelifati, Sebastian Husein, Barry Lai, Mariana Bertoni, Djoudi Bouhafs, Tonio Buonassisi, David P. Fenning, Hele Savin Conference Record of the IEEE Photovoltaic Specialists Conference, 2016
N-type black silicon solar cells Päivikki Repo, Jan Benick, Ville Vähänissi, Jonas Schön, Guillaume von Gastrow, Bernd Steinhauser, Martin C. Schubert, Martin Hermle, Hele Savin Energy Procedia, 2013