Gaurav Saini has been working as an Assistant Professor in the Department of Electronics and Communication Engineering at the National Institute of Technology, Kurukshetra since 2013. He has more than 15 years of research and teaching experience in various University systems in India. He has obtained Ph.D. degree from the Department of Electronics & Communication Engineering, NIT Kurukshetra, Haryana. He obtained his M. Tech degree in VLSI Design from National Institute of Technology, Hamirpur, India. He obtained his B. Tech degree from the UPTU Lucknow, India. He has presented and published over 55 research papers in reputed journals and various national and international conferences. His research interests include micro-electronics, modelling and simulation of nano-scale devices, low-power VLSI design and Internet of Things.
RESEARCH, TEACHING, or OTHER INTERESTS
Electrical and Electronic Engineering, Electrical and Electronic Engineering, Engineering, Electrical and Electronic Engineering
2-D Analytical Surface Potential Modeling and Simulation-Based Optimization of GoP-HD-DMDG-TFET for Enhanced Performance Nisha Yadav, Sunil Jadav, Gaurav Saini IEEE Transactions on Computer Aided Design of Integrated Circuits and Systems, 2026 This work presents a comprehensive surface potential analysis of the Gate-over-Pockets Hetero-Dielectric Dual-Metal Double-Gate Tunnel Field-Effect Transistor (GoP-HD-DMDG-TFET). The impact of pockets, dielectric thickness and permittivity, gate material work function, silicon body thickness, and gate and drain voltages are taken into account. An analytical model developed using the 2D Poisson’s equation, is validated against Sentaurus TCAD simulations. The impact of critical design parameters on the performance of GoP-HD-DMDG-TFET is investigated. The influence of pocket length (L<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">poc</sub>), tunneling-to-auxiliary gate length ratio (L<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">tunn</sub> : L<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">aux</sub>), pocket thickness (t<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">poc</sub>) and work function variation is systematically analyzed to optimize device performance for improved subthreshold behavior, ON-current, and I<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">on</sub>/I<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">off</sub> ratio. Results indicate that larger L<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">poc</sub> indicates a trade-off between improved ON-state performance and increased leakage current, with reduced Subthreshold Swing (SS). Moreover, tuning the tunneling-to-auxiliary gate length ratio (L<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">tunn</sub> : L<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">aux</sub>) significantly affects electrostatic control, influencing threshold voltage (V<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">th</sub>) and ON-current (I<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">ON</sub>). In addition, the pocket thickness (t<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">POC</sub>) is optimized to 4 nm, yielding the steepest subthreshold swing and highest I<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">on</sub>/I<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">off</sub> ratio. Work function engineering provides an effective approach to modulate the potential barrier and optimize leakage characteristics. These insights highlight the design flexibility of GoP-HD-DMDG-TFET, making it promising candidate for ultra-low-power and high-performance circuit applications.
Dual-gate material H-channel vertical DGTFET: design, simulation and optimisation study Arashpreet Kaur, Sonia Saini, Gaurav Saini Semiconductor Science and Technology, 2025 In this study, we introduce the dual-gate material H-channel vertical double-gate tunnel field effect transistor (TFET), designed to achieve a significantly improved current switching ratio ( I ON / I OFF ) while maintaining strong drive current and reduced OFF current. Utilising Sentaurus TCAD simulations, we find that reducing the channel thickness enhances key performance metrics, including ON and OFF currents and subthreshold swing (SS), due to the increased electric field that boosts charge carrier generation at the interface of the source–channel region. To minimise subthreshold leakage, a high- k dielectric is employed between the source–channel and drain regions. Additionally, incorporating a low-value work-function gate material at the source and high-value work-function material at the drain enhances the ON current and I ON / I OFF . This comprehensive analysis optimises geometrical dimensions and doping concentrations, including channel and oxide thickness. Unlike conventional TFETs, our structure features a source surrounded by the channel on three sides, increasing the band-to-band tunneling (BTBT) area and facilitating improved carrier transport. When compared to traditional double- ate TFETs, the proposed device demonstrates a steeper SS, over two orders of magnitude increase in ON current (5.48 × 10 −4 A µ m −1 ), I ON / I OFF of the order of 8.85 × 10 13 and an SS of 22 mV dec −1 . These improvements position our device as an excellent candidate for low-power applications, highlighting its significant potential in electronic device technology.
The Tunnel FET: Fundamentals, Calibration, and Simulation Nisha Yadav, Sunil Jadav, Gaurav Saini Nanoelectronics Fundamentals Advances and Applications, 2025 The tunnel field effect transistor (TFET) is the promising next-generation nanoscale transistor as it can provide steep sub-threshold swing characteristics ( SS < 60 mV/decade). This chapter begins with the challenges faced in metal oxide field effect transistor (MOSFET) scaling and thus the need of TFETs. Followed by origin of TFETs, the chapter underlines the fundamentals of a TFET and its working principle. In contrast to MOSFET, TFETs employs Band-To-Band Tunneling (BTBT) which has been explained in detail in this chapter. Following the technological advancements in the TFET structure, the chapter further covers the calibration of TFET from the experimental data using Sentaurus TCAD tool utilizing the dynamic non-local BTBT model. Calibration shows a close match with the experimental data. Finally, using extracted parameters, simulation of a double-gate TFET (DG-TFET) have been discussed in detail with the help of energy band diagrams. Though TFET provides a lot of advantages over its conventional counterparts, in the last, this chapter discusses the key challenges faced by the TFET technology.
Investigating the impact of dielectric modulation on multichannel junctionless Fin and nanosheet BioFET efficacy Sonia Saini, Gaurav Saini Physica Scripta, 2025 This study investigates the performance of a dielectric-modulated multi-channel junctionless Fin and nanosheet Bio field effect transistor (BioFET) in the sub-12 nm regime. The effects of various biomolecules on the electrical properties of the FETs are analyzed, revealing that the multi-channel nanosheet BioFET shows higher sensitivity for neutral biomolecules. In the structure of Fin and nanosheet BioFET, a layer of SiO2 followed by HfO2 is used as the bare oxide under metal. This stacking of the oxide layer helps in improving the switching ratio. Electrical characteristics of the BioFETs like transfer chracteristics, output characteristics curve, transconductance, output conductance, ON-state current, switching ratio, and sensitivity analysis are also performed. NS BioFET has 33.3 %, 50% and 28.57% higher subthreshold swing (SS) sensitivity than Fin BioFET and 54.8%, 62.3%, and 58.1 % higher ON-to OFF current ratio sensitivity at k = 3, 5 and 7 respectively. Gate all-around (GAA) Nanosheet BioFET offers the advantage of better performance over Fin BioFET due to the presence of multichannel and large-width nanosheets. The variations in all the characteristics are measured by varying dielectric constants in the range from 1 to 7.
Reversed C-shape Pocket Double Gate TFET with dual-κ Spacers Arashpreet Kaur, Devang Kailashkumar Vekariya, Gaurav Saini Indian Journal of Pure and Applied Physics, 2025 The study delves into the evaluation of the Double Gate Tunnel Field-effect Transistors (DGTFET) structures, Reversed C-shape Pocket TFET (RCSP-TFET), and RCSP-TFET with dual-k spacers. The TFET supports current generation through band-to-band tunneling among source/drain and channel regions. By strategically placing the three n+ pockets nearby the source-channel region, the tunneling barrier width is lowered and the current is increased in the ON-state. Subsequent to the calibration of the DGTFET utilizing diverse tunneling models, a comprehensive evaluation of the performance of the RCSP-TFET is undertaken. This assessment is executed through the meticulous optimization of the thickness and length of the n+ pocket, thereby ensuring precise and dependable outcomes. Furthermore, the spacer walls comprised of an amalgamation of high-k and low-k dielectrics is intended to augment the performance of the device. This approach seeks to optimize efficacy and improve operational capabilities. The optimized structure reveals a higher ON-state current (ION)= 7.0 x 10-5 (A/µm), the ON-OFF current ratio (ION/IOFF) , Ambipolar Current (IAmb)= 2.1x 10-13 (A/µm), reduced subthreshold swing (SS)=11.09 mV/decade) in the RCSP-TFET structure with dual-k spacers. The results imply the potential feasibility of the RCSP-TFET with dual-k spacers as a compelling choice for next-generation semiconductor technology.
A Comparative Study of Deep Learning Approaches for Early Detection of Sugarcane Diseases Aryan Kumar, Gaurav Saini Procedia Computer Science, 2025 Sugarcane, being one of the essential crops for the Indian agricultural economy, that has a significant contribution to the overall agricultural ecosystem of the country. However, the cultivation faces threats from variety of diseases and if, not treated in time bound fashion then it might result in poor yield and low quality, causing financial loss to the farmers. This study explores various approaches using deep learning to detect diseases that are affecting sugarcane cultivation. A dataset of over 6670 images across five classes (healthy, red rot, mosaic, rust, and yellow leaf) is taken. This study compares the performance of several deep learning models, including VGG-19, MobileNet-V2, EfficientNet, and Vision Transformer, with image processing techniques. Transfer learning is used with pre-trained models trained on the ImageNet dataset, and the Vision Transformer is fine-tuned during training. In this study, we found that Vision Transformer outperformed other deep learning models by achieving an accuracy of 98.0% and among the CNN models EfficientNet achieved an accuracy of 96.7%. The comparative analysis highlights the potential of various deep learning approaches for accurate disease detection in sugarcane cultivation. The research contributes to sustainable agricultural practices by providing a framework for early disease identification and prevention of crop losses through deep learning techniques.
Dual Pocket Step Channel TFET for Improved Low-Power Performance Abhinav Rajyan, Gaurav Saini Nano Fet Devices Miniaturization Simulation and Applications Part 1, 2025 In this chapter, we introduce a novel Tunnel Field-Effect Transistor (TFET) structure explicitly engineered for low-power applications. The proposed TFET structure offers an improved ION/IOFF current ratio and reduced subthreshold swing values, making it highly suitable for energy-efficient electronic devices. The design achieves a stepped channel by incorporating drain underlapping and channel engineering techniques, effectively reducing ambipolarity current. The proposed structure outperforms conventional TFETs with a 71% smaller average subthreshold swing (SS), demonstrating enhanced efficiency. These improvements address the demand for energy-efficient devices in fields such as portable electronics and the Internet of Things (IoT), demonstrating the innovative TFET structure's potential for low-power applications.
Cluster-based scheduling algorithm K P Alex Joseph, Gaurav Saini 2018 3rd IEEE International Conference on Recent Trends in Electronics Information and Communication Technology Rteict 2018 Proceedings, 2018
Comparative Design of Common Source Low Noise Amplifier using Inductive Degeneration A Pandey, G Saini 2026 9th International Conference on Intelligent Computing and Control … , 2026 2026
Recent Advances and Prospects of Nano Polymers in Environmental Remediation S Singh, G Mittal, G Saini, R Budania, R Gupta Nanostructured Polymers: Synthesis and Performance, 497-522 , 2026 2026
Performance investigation of junctionless nanosheet FET with dual-k sidewall spacer using numerical simulations S Saini, G Saini International Journal of Electronics 113 (2), 333-348 , 2026 2026
Dual-gate material H-channel vertical DGTFET: design, simulation and optimisation study A Kaur, S Saini, G Saini Semiconductor Science and Technology 40 (12), 125005 , 2025 2025
2-D Analytical Surface Potential Modeling and Simulation-Based Optimization of GoP-HD-DMDG-TFET for Enhanced Performance N Yadav, S Jadav, G Saini IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems , 2025 2025
White light emission from a mixture of carbon dots and gold nanoclusters and its application for optical detection of Hg2+ and Fe3+ ions S Singh, G Saini, B Sharma Materials Today Chemistry 50, 103183 , 2025 2025 Citations: 1
Dual Pocket Step Channel TFET for Improved Low-Power Performance A Rajyan, G Saini Nano-FET Devices: Miniaturization, Simulation, and Applications (Part 1 … , 2025 2025
The Tunnel FET: Fundamentals, Calibration, and Simulation N Yadav, S Jadav, G Saini Nanoelectronics: Fundamentals, Advances, and Applications, 333-362 , 2025 2025
Physical Design Implementation and Power Optimization of RV32I RISC-V Processor DK Vekariya, G Saini, AR Manohar 2025 International Conference on Electronics and Computing, Communication … , 2025 2025
Investigating the impact of dielectric modulation on multichannel junctionless Fin and nanosheet BioFET efficacy S Saini, G Saini Physica Scripta 100 (8), 085014 , 2025 2025
Liposome-like encapsulation of fish oil-based self-nano emulsifying formulation for improved bioavailability I Ahmad, A Dogra, T Nagpal, C Sharma, S Singh, N Shaiva, G Saini, ... Applied Food Research 5 (1), 100745 , 2025 2025 Citations: 6
Reversed C-shape Pocket Double Gate TFET with dual-κ Spacers A Kaur, DK Vekariya, G Saini Indian Journal of Pure & Applied Physics (IJPAP) 63 (4), 312-318 , 2025 2025
Linearity performance and harmonic distortion analysis of gate-over-pockets hetero-dielectric dual-metal-double-gate TFET for RF applications N Yadav, S Jadav, G Saini Micro and Nanostructures 199, 208074 , 2025 2025 Citations: 2
A Comparative Study of Deep Learning Approaches for Early Detection of Sugarcane Diseases A Kumar, G Saini Procedia Computer Science 260, 182-190 , 2025 2025 Citations: 3
Steep subthreshold swing Double-Gate tunnel FET using source pocket engineering: Design guidelines N Yadav, S Jadav, G Saini Micro and Nanostructures 195, 207951 , 2024 2024 Citations: 6
SystemVerilog Based Design of an RV32I Compliant RISC-V Processor Core A Rajyan, G Saini 2024 5th IEEE Global Conference for Advancement in Technology (GCAT), 1-5 , 2024 2024 Citations: 2
Drain Source-Engineered Double-Gate Tunnel FET for Improved Performance: A. Kaur, G. Saini A Kaur, G Saini Journal of Electronic Materials 53 (7), 3901-3913 , 2024 2024 Citations: 2
Improving On-state current and Ambipolarity of TFET using Gate-Drain and Gate Dielectric Engineering G Saini, A Ganta Indian Journal of Pure & Applied Physics (IJPAP) 62 (7), 607-613 , 2024 2024 Citations: 1
Performance comparison of junctionless finfet with nanosheet fet and device design guidelines S Saini, G Saini Indian Journal of Pure & Applied Physics (IJPAP) 62 (6), 490-502 , 2024 2024 Citations: 2
Comparative Study of Nanowire FET & Internal Gate Nanowire FET A Rajyan, G Saini 2024 2nd International Conference on Device Intelligence, Computing and … , 2024 2024
MOST CITED SCHOLAR PUBLICATIONS
Physical scaling limits of FinFET structure: a simulation study G Saini, AK Rana International Journal of VLSI design & communication Systems (VLSICS) 2 (1 … , 2011 2011 Citations: 64
New low-power techniques: leakage feedback with stack & sleep stack with keeper PK Pal, RS Rathore, AK Rana, G Saini 2010 International Conference on Computer and Communication Technology … , 2010 2010 Citations: 41
A graded channel dual-material gate junctionless MOSFET for analog applications V Pathak, G Saini Procedia Computer Science 125, 825-831 , 2018 2018 Citations: 34
Improving the performance of dual-k spacer underlap Double Gate TFET A Chauhan, G Saini, PK Yerur Superlattices and microstructures 124, 79-91 , 2018 2018 Citations: 21
Improving the subthreshold performance of junctionless transistor using spacer engineering G Saini, S Choudhary Microelectronics Journal 59, 55-58 , 2017 2017 Citations: 21
Asymmetric dual-k spacer trigate FinFET for enhanced analog/RF performance G Saini, S Choudhary Journal of Computational Electronics 15 (1), 84-93 , 2016 2016 Citations: 20
A stable and power efficient SRAM cell G Saini 2015 International Conference on Computer, Communication and Control (IC4), 1-5 , 2015 2015 Citations: 18
Leakage behavior of underlap FinFET structure: A simulation study G Saini, AK Rana, PK Pal, S Jadav 2010 International Conference on Computer and Communication Technology … , 2010 2010 Citations: 18
Modeling of dual material surrounding split gate junctionless transistor as biosensor M Maji, G Saini Superlattices and Microstructures 135, 106290 , 2019 2019 Citations: 17
Efficient power management circuit for RF energy harvesting with 74.27% efficiency at 623nW available power G Saini, S Sarkar, M Arrawatia, MS Baghini 2016 14th IEEE International New Circuits and Systems Conference (NEWCAS), 1-4 , 2016 2016 Citations: 16
Impact of radial compression on the conductance of carbon nanotube field effect transistors S Choudhary, G Saini, S Qureshi Modern physics letters B 28 (02), 1450007 , 2014 2014 Citations: 16
Improving the performance of SRAMs using asymmetric junctionless accumulation mode (JAM) FinFETs G Saini, S Choudhary Microelectronics journal 58, 1-8 , 2016 2016 Citations: 15
Geometrical variability impact on the performance of sub-3 nm gate-all-around stacked nanosheet FET N Yadav, S Jadav, G Saini Silicon 14 (16), 10681-10693 , 2022 2022 Citations: 14
L-shaped tunnelling field effect transistor with hetero-gate dielectric and hetero dielectric box S Beniwal, G Saini 2019 3rd International Conference on Trends in Electronics and Informatics … , 2019 2019 Citations: 14
Low power high throughput current mode signalling technique for global VLSI interconnect S Jadav, G Khanna, A Kumar, G Saini 2010 International Conference on Computer and Communication Technology … , 2010 2010 Citations: 14
Impact of Gate Length and Doping Variation on the DC and Analog/RF Performance of sub - 3 n m Stacked Si Gate-All-Around Nanosheet FET N Yadav, S Jadav, G Saini Silicon 15 (1), 217-228 , 2023 2023 Citations: 11
Design and Analysis of a Novel Asymmetric Source Dual-Material DG-TFET with Germanium Pocket: A. Kaur and G. Saini A Kaur, G Saini Silicon 15 (6), 2889-2900 , 2023 2023 Citations: 10
Investigation of trigate JLT with dual- k sidewall spacers for enhanced analog/RF FOMs G Saini, S Choudhary Journal of Computational Electronics 15 (3), 865-873 , 2016 2016 Citations: 9
Stacked keeper with body bias: A new approach to reduce leakage power for low power VLSI design KN Bhargav, A Suresh, G Saini 2014 IEEE international conference on advanced communications, control and … , 2014 2014 Citations: 9
Study on the negative transconductance behaviour in GaAs/AlGaAs based HEMT SK Singh, AK Tripathi, G Saini Superlattices and Microstructures 146, 106684 , 2020 2020 Citations: 8