Manvendra Singh Khatri is currently working as an Assistant Professor (Grade-I) in the Department of Physics. Before joining to NITUK, he has worked as Assistant Professor at NIT Hamirpur and Kurukshetra University, Kurukshetra, respectively. He received B.Sc. and M. Sc. from H. N. B. Garhwal University, Srinagar (Garhwal) in the year 1998 and 2000, respectively. He obtained his Ph.D. in Physics from the Technical University, Dresden, Germany in the year 2010. He has also worked as a postdoctoral fellow in the Department of Physics, National Taiwan University, Taipei, Taiwan during 2010-2011. His research interests include electrodeposition of thin films, nanowires, multilayers and composite materials.
Structural, Compositional and Corrosion Characterization of Ni–W Thin Films Ajay Kumar Singh, Himanshu Saini, Manvendra Singh Khatri Protection of Metals and Physical Chemistry of Surfaces, 2024 Abstract Ni–W thin films are fabricated on an ITO coated glass substrate by varying the current density. Cyclic voltammetry is carried out to know the required range of deposition potential for the synthesis of thin films. The influence of electrodeposition parameters on composition, crystal structure, micro-strain and corrosion properties of the film is studied. The presence of diffraction peaks at 2θ values of 43.9°, 50.7°, and 74° corresponding to (111), (200), and (220) planes have confirmed the face centered cubic structure of Ni–W films. Additionally, the (110) and (101) diffraction peaks recorded at 2θ values of 21.3° and 30.4° are attributed to the formation of Ni4W phase. The formation of homogeneous, compact and cauliflower like morphology is confirmed by high resolution FESEM. The corrosion behavior of the films is investigated using Tafel Polarization technique in a 3.5 wt % NaCl solution. Ni–W film deposited at a current density of ‒50 mA/cm2 has shown corrosion potential of –276 mV and highest corrosion resistance of 1917 Ω-cm2. The enhanced corrosion resistance of Ni–W alloy is caused by the preferential dissolution of Ni and the formation of a W-rich film on the surface, which prevented additional corrosion.
Electrochemical Characterization and Corrosion Analysis of Cu–Ni Films Electrodeposited from Different pH Bath Himanshu Saini, Sunil Gangwar, C. S. Yadav, M. S. Khatri Protection of Metals and Physical Chemistry of Surfaces, 2023 The article discusses the galvanostatic deposition of Cu–Ni films on ITO-coated glass substrate from an aqueous sulphate electrolyte at different pH values. All the films are deposited at a fixed cathodic current of 10 mA by electrodeposition technique. The presence of (111), (200) and (220) X-ray diffraction peaks observed at 2 $${{\theta \;}}$$ ~ 43°, 50° and 74° indicate that films deposited at different pH values of 1 to 5, have face-centered cubic structure. The increase in crystallite size from 80 to 144 nm, with the variation of pH from 1 to 5 indicates a significant effect of the bath pH on the deposition process. The binding energy peaks at 856 and 861 eV observed in X-ray photoelectron spectroscopy have confirmed the presence of Ni2+ in the hydroxide of nickel (Ni(OH)2) and Ni3+ in the oxyhydroxide of nickel (NiOOH), respectively. The binding energy peaks observed at 932.43, 933 and 952.70 eV in XPS are related to Cu(OH)2, Cu2O, CuO and Cu in all the films deposited at different pH values. The highest corrosion resistance of 52 and 42 kΩ cm2 obtained by Tafel analysis for the films deposited at pH 3 and 5, respectively, is attributed to the presence of both oxide and hydroxide species.
Synthesis and Characterization of Cu-Ni Thin Films at Different pH Baths: A Comparative Study Using XRD, XPS and Corrosion Analysis Himanshu Saini, Sunil Gangwar, C S Yadav, M S Khatri Journal of Physics Conference Series, 2023 Cu-Ni films are electrodeposited at a cathodic current of 10 mA via galvanostatic mode on ITO-coated glass substrates. It found by X-ray diffraction that the films crystalized into fcc structure with the highest intensity corresponding to (111) plane at a two-theta value of 43°. The presence of binding energy peaks at 856.57 eV, 861 eV, 933 eV, and 952 eV observed in X-ray photoelectron spectroscopy have confirmed the presence of nickel oxide/hydroxide and copper oxide/hydroxide, respectively. Tafel polarization studies conducted in 3.5 wt. % sodium chloride solution shows the shifts in Ecorr towards the positive side and decrease of Icorr with the passage of exposure time is attributed to the formation of protective oxides/hydroxides layers of Cu and Ni elements in the films.
Fabrication and characterization of electrodeposited crystalline Au nanowires into anodic alumina templates Journal of Optoelectronics and Advanced Materials, 2022
