Electronic structure and optical properties of nitrogen doped SnO2 - Simulation by DFT method M. Maleki Acta Physica Polonica A, 2020 In this paper, nanostructured tin oxide doped with Nitrogen was investigated by first principle calculations. At first, band structure, density of states, and projected density of states were evaluated for pure tin oxide. Then, the effect of doping with Nitrogen was studied for cases when N replaces O atom, Sn atom, respectively, and in two interstitials situation. Results were compared with pure reference case. Except of one interstitial case, Nitrogen doping usually plays the role of a p-type doping, however the decrease of band gap occurs in all cases.
Ab initio calculations of the effect of N, Nb, and Ta doping on the electronic structure and optical properties of SnO2 M. Maleki Journal of Computational Electronics, 2020 Nanostructured nitrogen-, niobium-, and tantalum-doped tin oxides are investigated by first-principle calculations. First, the band structure, bond length, density of states, and projected density of states of pure tin oxide are evaluated. Then, the effect of nitrogen, niobium, and tantalum doping substituting O and Sn is compared with the pure case. In all cases, substitutional doping with N results in p-type conductivity whereas n-type conductivity results from Nb and Ta doping. Substitution of O with N and of Sn with Nb or Ta increases the bandgap of the structure, while substitution of Sn and Nb with N reduces the bandgap.
Si/ZnO nano structured heterojunctions by APCVD method Iranian Journal of Materials Science and Engineering, 2015
Dependence of ZnO nanostructured thin films properties on growth temperature by APCVD method M. Maleki, S.M. Rozati Acta Physica Polonica A, 2015 In this paper, the e ect of substrate temperature on the electrical, structural, morphological and optical properties of nanostructured polycrystalline zinc oxide thin lms were investigated by the Hall measurement, Xray di raction, scanning electron microscopy and UV-visible spectrophotometer, respectively. Then these modi ed thin lms were deposited on two kinds of single crystal and polycrystalline of nand p-type Si in three di erent substrate temperatures of 300, 400 and 500 ◦C by low cost atmospheric pressure chemical vapor deposition method. Like the samples grown on the glass substrate, with increase of the temperature in samples grown on single crystal Si, preferred orientation changes from (100) to (002), while in samples deposited on poly crystalline Si, preferred orientation remains (100).
Investigation of the effect of the substrate position relative to the source on the optoelectrical and structural properties of pure nanostructured tin oxide by APCVD Masoudeh Maleki, Seyed Mohammad Rozati Chemical Vapor Deposition, 2014 Pure tin oxide (TO) films are deposited onto glass substrates at various substrate angles relative to the source position by a simple and inexpensive method of atmospheric pressure (AP)CVD. The deposition temperature is constant at about 500°C, and oxygen with a flow rate of 100 sccm is used as both the carrier gas and the oxidizing agent. Investigation of the sheet resistance shows that resistivity varies between 106 and. 241 Ω/□. X-ray diffraction (XRD) also reveals that the structure is polycrystalline with the preferred orientation of (110) for all films deposited at the various substrate angles. Scanning electron microscopy (SEM) images also reveal a uniform and impacted structure on the surface of all the films. Optical properties show clear changes as a result of the substrate position versus the source.
An economic CVD techniéue for pure SnO2 thin films deposition: Temperature effects M MALEKI, S M ROZATI Bulletin of Materials Science, 2013 A modified new method of CVD for formation of pure layers of tin oxide films was developed. This method is very simple and inexpensive and produces films with good electrical properties. The effect of substrate temperature on the sheet resistance, resistivity, mobility, carrier concentration and transparency of the films has been studied. The best sheet resistance obtained at substrate temperature of 500 °C was about 27 Ω/cm2. X-ray diffraction showed that the structure of deposited films was polycrystalline with a grain size between 150–300 Å. The preferred orientation was (211) for films deposited at substrate temperature of about 500 °C. FESEM micrographs revealed that substrate temperature is an important factor for increasing grain size and modifies electrical parameters. UV-visible measurement showed reduction of transparency and bandgap of the layers with increasing substrate temperature.
Structural, electrical and optical properties of transparent conducting SnO 2 films: Effect of the oxygen flow rate M Maleki, S M Rozati Physica Scripta, 2012 Pure tin oxide films were deposited onto glass substrate at different oxygen flow rates by a simple and inexpensive method of air pressure chemical vapor deposition. The deposition temperature was kept constant at about 500 °C, and oxygen with a flow rate of 0–400 sccm was used as both a carrier gas and the oxidizing agent. Investigation of the electrical parameters variations showed that these parameters vary with oxygen flow rate, reaching an optimum value at the flow rate of 100 sccm. X-ray diffraction (XRD) also revealed the structure to be polycrystalline for all films deposited at different oxygen flow rates. In agreement with the XRD results, field emission scanning electron microscopy micrographs showed a reduction in grain size corresponding to increasing flow rates until 200 sccm, and after that, with a further increase of flow rate, the grain size increased.
Electronic Structure and Optical Properties of Nitrogen Doped SnO2-Simulation by DFT Method M Maleki Acta Physica Polonica, A. 137 (3) , 2020 2020 Citations: 5
Ab initio calculations of the effect of N, Nb, and Ta doping on the electronic structure and optical properties of SnO 2 M Maleki Journal of Computational Electronics 19 (1), 47-54 , 2020 2020 Citations: 4
Si/ZnO NANO STRUCTURED HETEROJUNCTIONS BY APCVD METHOD M Maleki, M Rozati Iranian Journal of Materials Science and Engineering 12 (4), 19-27 , 2015 2015 Citations: 1
Dependence of ZnO Nanostructured Thin Films Properties on Growth Temperature by APCVD Method M Maleki, SM Rozati Acta Physica Polonica, A. 28 (3) , 2015 2015 Citations: 7
Investigation of the Effect of the Substrate Position Relative to the Source on the Optoelectrical and Structural Properties of Pure Nanostructured Tin Oxide by APCVD M Maleki, SM Rozati Chemical Vapor Deposition 20 (10-11-12), 352-355 , 2014 2014 Citations: 5
Dependence of Si/SnO2 Heterojunction Properties on Growth Temperature and Type of Silicon** M Maleki, SM Rozati Chemical Vapor Deposition 19 (7-8-9), 290-294 , 2013 2013 Citations: 3
An economic CVD technique for pure SnO 2 thin films deposition: Temperature effects M Maleki, SM Rozati Bulletin of Materials Science 36 (2), 217-221 , 2013 2013 Citations: 38
Investigation of electrical properties and surface morphology In Nitrogen doped Tin oxide By APCVD method; Barresi-e khavas-e elektriki va morfolozhi-e sathi dar oksid-e ghal'e … M Maleki, M Rozati 2012
Structural, electrical and optical properties of transparent conducting SnO2 films: effect of the oxygen flow rate M Maleki, SM Rozati Physica Scripta 86 (1), 015801 , 2012 2012 Citations: 21
Investigation of electrical properties and surface morphology In Nitrogen doped Tin oxide By APCVD method M Maleki, M Rozati 2012
Binding Energies of Donor States in GaAs-GaAlAs Quantum Wells Under Hydrostatic Pressure H Panahi, M Maleki Journal of Applied Sciences 8 (4), 636-641 , 2008 2008 Citations: 8
Binding Energies of Donor States in GaAs-GaAlAs Quantum Wells Under Hydrostatic Pressure H Panahi, M Maleki Journal of Applied Sciences 8 (4), 636-641 , 2008 2008 Citations: 8
Effects of hydrostatic pressure on the donor binding energy and intra donor transition matrix elements in GaAs–GaAlAs quantum wells HPM Maleki physica status solidi (b) 245 (5), 967 , 2008 2008 Citations: 12
MOST CITED SCHOLAR PUBLICATIONS
An economic CVD technique for pure SnO 2 thin films deposition: Temperature effects M Maleki, SM Rozati Bulletin of Materials Science 36 (2), 217-221 , 2013 2013 Citations: 38
Structural, electrical and optical properties of transparent conducting SnO2 films: effect of the oxygen flow rate M Maleki, SM Rozati Physica Scripta 86 (1), 015801 , 2012 2012 Citations: 21
Effects of hydrostatic pressure on the donor binding energy and intra donor transition matrix elements in GaAs–GaAlAs quantum wells HPM Maleki physica status solidi (b) 245 (5), 967 , 2008 2008 Citations: 12
Binding Energies of Donor States in GaAs-GaAlAs Quantum Wells Under Hydrostatic Pressure H Panahi, M Maleki Journal of Applied Sciences 8 (4), 636-641 , 2008 2008 Citations: 8
Binding Energies of Donor States in GaAs-GaAlAs Quantum Wells Under Hydrostatic Pressure H Panahi, M Maleki Journal of Applied Sciences 8 (4), 636-641 , 2008 2008 Citations: 8
Dependence of ZnO Nanostructured Thin Films Properties on Growth Temperature by APCVD Method M Maleki, SM Rozati Acta Physica Polonica, A. 28 (3) , 2015 2015 Citations: 7
Electronic Structure and Optical Properties of Nitrogen Doped SnO2-Simulation by DFT Method M Maleki Acta Physica Polonica, A. 137 (3) , 2020 2020 Citations: 5
Investigation of the Effect of the Substrate Position Relative to the Source on the Optoelectrical and Structural Properties of Pure Nanostructured Tin Oxide by APCVD M Maleki, SM Rozati Chemical Vapor Deposition 20 (10-11-12), 352-355 , 2014 2014 Citations: 5
Ab initio calculations of the effect of N, Nb, and Ta doping on the electronic structure and optical properties of SnO 2 M Maleki Journal of Computational Electronics 19 (1), 47-54 , 2020 2020 Citations: 4
Dependence of Si/SnO2 Heterojunction Properties on Growth Temperature and Type of Silicon** M Maleki, SM Rozati Chemical Vapor Deposition 19 (7-8-9), 290-294 , 2013 2013 Citations: 3
Si/ZnO NANO STRUCTURED HETEROJUNCTIONS BY APCVD METHOD M Maleki, M Rozati Iranian Journal of Materials Science and Engineering 12 (4), 19-27 , 2015 2015 Citations: 1
Investigation of electrical properties and surface morphology In Nitrogen doped Tin oxide By APCVD method; Barresi-e khavas-e elektriki va morfolozhi-e sathi dar oksid-e ghal'e … M Maleki, M Rozati 2012
Investigation of electrical properties and surface morphology In Nitrogen doped Tin oxide By APCVD method M Maleki, M Rozati 2012